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Concept
Sputter Yield
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Summary
Sputter Yield
is a crucial parameter in
Materials Science
and
Thin film research
, describing the
Number of atoms
ejected from a surface per
Incident ion
during sputtering. It is influenced by factors such as the energy and
Mass of the ions
, the
Angle Of Incidence
, and the
Binding Energy
of the
Target Material
's
Surface atoms
.
Concepts
Ion Beam Sputtering
Energy Dependence
Angular Dependence
Target Atomic Mass
Surface Binding Energy
Thin Film Deposition
Secondary Ion Mass Spectrometry
Surface Morphology
Material Sputtering
Relevant Degrees
Measurement of Geometric and Mechanical Quantities 50%
Electric Current 30%
Molecular Properties 20%
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