Ion Beam Sputtering is a thin-film deposition technique where a focused ion beam is directed at a target material, causing atoms to be ejected and deposited onto a substrate. It allows for precise control of film thickness and composition, making it invaluable for applications in the semiconductor and optical industries.

Ion Beam Sputtering

Thin-film deposition technique

Focused ion beam

Target material refers to the specific substance or element that is subjected to a process or experiment, often to observe its reactions or properties under certain conditions. It plays a crucial role in fields like physics, chemistry, and materials science, where understanding its interactions can lead to advancements in technology and scientific knowledge.

Target Material

Atoms ejected

A substrate is the underlying substance or layer that supports or is the surface on which an organism grows or is attached, or it is the substance on which an enzyme acts in biochemical reactions. Understanding substrates is crucial in fields such as biology, chemistry, and environmental science as they influence the behavior and interaction of organisms and reactions.

Substrate

Film thickness refers to the measurement of the depth or thickness of a film or coating layer, which is crucial for ensuring the desired performance and functionality of the material. Accurate measurement and control of film thickness are essential in various industries to optimize product quality, durability, and efficiency.

Film Thickness

Film composition is the art of arranging visual elements within a frame to convey a narrative, evoke emotions, and guide the viewer's attention. It involves a deliberate use of space, color, light, and movement to enhance storytelling and create a cohesive visual experience.

Concepts

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