English
New Course
Concept
Ion Beam Sputtering
Follow
0
Summary
Ion Beam Sputtering
is a
Thin-film deposition technique
where a
Focused ion beam
is directed at a
Target Material
, causing atoms to be ejected and deposited onto a substrate. It allows for precise control of
Film Thickness
and composition, making it invaluable for applications in the semiconductor and optical industries.
Concepts
Thin-film Deposition
Ion Beam
Target Material
Substrate
Film Thickness Control
Material Composition
Ejected Atoms
Sputtering Yield
Substrate Temperature
Vacuum Systems
Material Sputtering
Sputter Yield
Relevant Degrees
Elasticity 100%
Start Learning Journey
Generate Assignment Link
Lessons
Concepts
Suggested Topics
Foundational Courses
Activity
Your Lessons
Your lessons will appear here when you're logged in.
Log In
Sign up