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Concept
Plasma Processing
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Summary
Plasma Processing
is a technology that utilizes
Ionized Gases
to modify the
Surface Properties
of materials, widely used in
Semiconductor Manufacturing
and
Materials Science
. It enables
Precise etching
, deposition, and
Cleaning processes
, which are essential for creating micro- and
Nano-scale structures
with
High Precision
and efficiency.
Concepts
Plasma Etching
Chemical Vapor Deposition
Physical Vapor Deposition
Reactive Ion Etching
Surface Modification
Ionized Gas
Thin Film Deposition
Microfabrication
Nanofabrication
Semiconductor Manufacturing
Non-contact Process
Non-contact Processing
Relevant Degrees
Machining and Working with Chips 67%
Condensed Matter Physics 33%
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