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Concept
Chemical Vapor Deposition
Summary
Chemical Vapor Deposition
(CVD) is a process used to produce high-quality, high-performance
solid materials
, typically under vacuum, by depositing a
thin film of material
onto a substrate. This method is widely used in the
semiconductor industry
to create materials with
precise properties
and compositions, essential for
modern electronics
and
nanotechnology applications
.
Relevant Degrees
Production and Preparation 67%
Production Process Variables 33%
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