English
New Course
Concept
Low Pressure Chemical Vapor Deposition
Summary
Low pressure chemical vapor deposition
(LPCVD) is a process used in
semiconductor manufacturing
to deposit
thin films
of various materials onto substrates by utilizing
chemical reactions
at
reduced pressures
. This method offers advantages such as improved uniformity and
step coverage
, making it ideal for creating high-quality
thin films
for
electronic components
.
Generate Assignment Link
Lessons
Concepts
Suggested Topics
Foundational Courses
Your Lessons
Your lessons will appear here when you're logged in.
Log In
Sign up
3