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Concept
Low Pressure Chemical Vapor Deposition
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Summary
Low Pressure Chemical Vapor Deposition
(LPCVD) is a process used in
Semiconductor Manufacturing
to deposit
Thin Films
of various materials onto substrates by utilizing
Chemical Reactions
at
Reduced pressures
. This method offers advantages such as improved uniformity and
Step Coverage
, making it ideal for creating high-quality
Thin Films
for
Electronic Components
.
Concepts
Thin Film Deposition
Semiconductor Manufacturing
Chemical Reactions
Reduced Pressure
Uniformity
Step Coverage
Electronic Components
Substrate
Material Properties
Deposition Rate
Low Pressure Physics
Silicon Dioxide Deposition
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