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Concept
Plasma Sputtering
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Summary
Plasma Sputtering
is a technique used in
Material science and engineering
to deposit
Thin Films
on a substrate by bombarding a
Target Material
with
Energetic ions
from a plasma, causing atoms to be ejected and settle onto a surface. This versatile process enables precise control over
Film Thickness
and composition, making it integral for applications like
Semiconductor Fabrication
and
Coating Technologies
.
Concepts
Thin Film Deposition
Ion Bombardment
Plasma Physics
Sputtering Yield
Physical Vapor Deposition
Target Material
Substrate Technology
Vacuum Systems
Coating Technology
Semiconductor Fabrication
PVD (Physical Vapor Deposition)
Material Sputtering
Relevant Degrees
Condensed Matter Physics 100%
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